Product Overview
Advanced Energy Dressler VM 1000 A RF Matching Network - Professional 13.56 MHz 1000W Impedance Matching System for Semiconductor Manufacturing
Condition: Appears to be in good condition based on our visual inspection. The unit powers on, and the fan operates strongly and correctly.
High-Performance RF Matching Technology for Precision Plasma Applications
The AE Dressler VM 1000 A is a professional-grade RF matching network designed for demanding semiconductor and plasma processing applications. Part of the renowned VarioMatch™ platform, this powerful 1000-watt impedance matching system operates at the industry-standard 13.56 MHz frequency, delivering exceptional performance for critical manufacturing processes.
Technical Specifications
- Model: VM 1000 A from Advanced Energy/Dressler
- Maximum RF Power Handling: 1000 watts
- Operating Frequency: 13.56 MHz (industry standard)
- Automatic Impedance Matching Capability
- Compatible with Cesar series RF generators
- Dual Operation Modes: Automatic and Manual tuning
- Robust Metal Enclosure with Efficient Cooling System
- Industry-Standard Water and RF Connections
Advanced Plasma Processing Applications
This professional RF matching network is engineered for critical applications in:
- Semiconductor Fabrication and Wafer Processing
- Precision Plasma Etching Systems
- Thin Film Deposition Equipment
- Physical Vapor Deposition (PVD) Processes
- Industrial Sputtering Applications
- Research and Development Laboratories
- Advanced Materials Processing
Superior Performance Benefits
- Maximizes Power Transfer Efficiency between RF generator and plasma chamber
- Minimizes Reflected Power for optimal process stability
- Provides Consistent Plasma Conditions for repeatable manufacturing results
- Handles High-Power Applications with reliable performance
- Seamless Integration with industry-standard equipment
- Fast Impedance Matching for improved throughput
Essential Component for Precision Manufacturing
The VM 1000 A RF matching network serves as a critical intermediary between your RF power source and plasma chamber, ensuring optimal power delivery and process stability. By automatically matching impedance between these components, this system delivers maximum energy transfer efficiency while minimizing reflected power—essential for consistent, high-quality results in semiconductor manufacturing and advanced materials processing.
Condition and Testing
This used AE Dressler VM 1000 A matching network has been visually inspected and powers on properly with strong fan operation. While full functionality testing in a production environment has not been performed, the unit appears to be in good working condition and ready for integration into your plasma processing system.
Why Choose Advanced Energy RF Matching Networks?
Advanced Energy's match networks expertly perform across multiple power ranges to enable fast, accurate, and reliable impedance matching. The VarioMatch platform expedites tuning and tightens process control with easily installed plug-and-play functionality, making it the preferred choice for semiconductor manufacturers and research facilities.
